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Fluorine | F2
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Purity
99.0% Min
Molecular Formula
F2
Product Usage
Fluorine gas, due to its lack of greenhouse gas emissions, has emerged as a promising alternative for cleaning chemical vapor deposition (CVD) reactor chambers in the semiconductor field.
Packaging Available
40L
Valve Available
CGA580, DISS718
CONTACT US
FluorLink Holding Limited
Fluorlink International Limited
Tel: +86 574 2765 6060
Fax: +86 574 2765 6060
E-mail: info@fluorlink.com
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