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Purity 99.999%
Molecular Formula C2F6
Product Usage Hexafluoroethane is used as a versatile etchant in semiconductor manufacturing. It can be used for selective etching of metal silicides and oxides versus their metal substrates and also for etching of silicon dioxide over silicon.
Packaging Available 40L, 44L, 47L, 50L
Valve Available CGA660, CGA320, DISS716